Author: Irisboyev, Farkhod Boymirzayevich; Mukhtorov, Doston Naim ugli

Annotation: The method of photolithography has already been given with great accuracy in the structures of YaO' a shape with topology is drawn and then it is technologically processed. A special photographic process in photoresist (light-sensitive polymer layers). Photoresists. FRs are light-sensitive materials that dissolve under the influence of light form is processed based on the change event. In the spraying method, FR is compressed air is scattered on the surface of the sample. This method makes it possible to obtain thick FR.

Keywords: Photolithography method, light exposure, Photoresists, photoresist strengthening, drawing using a photo template, shape beam, eroding unnecessary areas, removing excess FR.

Pages in journal: 107 - 110